MPW / Shuttle access

WIN Semiconductors 0.10µm GaN HEMT MPW

Plan a 0.10µm GaN HEMT multi-project wafer run at WIN Semiconductors through TOMPW Service. We coordinate shared-mask access, EDA sign-off, shuttle scheduling and the downstream packaging or test path for global chip teams.

Node: 0.10µm GaN HEMTMPW, NTO and production evaluation

Why 0.10µm GaN HEMT

0.10µm GaN HEMT is one of the process options TOMPW coordinates as a shared-mask MPW run at the partner foundry. We handle slot selection, EDA checks and logistics so your design reaches the line on schedule.

What a 0.10µm GaN HEMT MPW at WIN Semiconductors involves

A 0.10µm GaN HEMT MPW (multi-project wafer) shuttle places several customer designs on one shared mask set, so each team pays only for its portion of the wafer. TOMPW Service handles slot selection, DRC/LVS review and logistics so your GDSII reaches WIN Semiconductors's line on schedule.

Step 1
GDSII & spec
Share your GDSII, target node and tape-out window.
Step 2
Slot & mask share
TOMPW books the next shuttle and aligns mask share.
Step 3
Wafer, package, test
Wafers returned, then package/test aligned as needed.

✓GaAs and GaN MPW shuttles

✓RF and mmWave process support

✓Compound-semiconductor packaging coordination

✓High-frequency device fabrication

Platforms across WIN Semiconductors

Foundry-level platforms, not a list of everything 0.10µm GaN HEMT offers. Which of these apply to your 0.10µm GaN HEMT run is confirmed per project.

GaAs pHEMT

GaN HEMT

Compound Semiconductor

RF / mmWave

Notes on working with WIN Semiconductors

WIN runs regular GaAs/GaN MPW shuttles (e.g. NP12, PIN, PP series) through the year.
TOMPW can coordinate compound-semiconductor MPW and downstream test.

Best-fit applications

RF and mmWave front-ends5G and wireless infrastructurePower amplifiers and RF devicesHigh-frequency applications

Expert reviewed

This page is reviewed by Henry, CEO, TOMPW Service. Henry is the CEO of TOMPW Service and a chip-design specialist with 20 years in the semiconductor industry.

Discuss a 0.10µm GaN HEMT MPW at WIN Semiconductors

TOMPW Service can coordinate a 0.10µm GaN HEMT MPW shuttle with WIN Semiconductors as part of a scoped execution path.

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COMMON QUESTIONS

Working with WIN Semiconductors 0.10µm GaN HEMT MPW through TOMPW

Can TOMPW arrange a 0.10µm GaN HEMT MPW shuttle at WIN Semiconductors?

Yes. TOMPW coordinates 0.10µm GaN HEMT MPW and shuttle access at WIN Semiconductors for overseas teams, handling slot selection, EDA checks and logistics so your design reaches the shared mask on schedule.

What does a 0.10µm GaN HEMT MPW run at WIN Semiconductors typically include?

A 0.10µm GaN HEMT MPW run bundles your design onto a shared reticle with other projects, covering mask share and wafer fabrication at WIN Semiconductors. Wafer-level probe is included only on the shuttles that offer it, so we confirm probe coverage for the specific run before you commit. Packaging, final test and the NTO transition are scoped separately with TOMPW.

How long does a 0.10µm GaN HEMT MPW cycle take at WIN Semiconductors?

Cycle time depends on WIN Semiconductors's shuttle cadence for 0.10µm GaN HEMT, usually a few months from mask data to returned wafers. Missing a window means waiting for the next one, so TOMPW recommends booking early.

What comes after a 0.10µm GaN HEMT MPW at WIN Semiconductors?

After a successful 0.10µm GaN HEMT MPW, teams typically move to NTO or full-mask production. TOMPW helps plan that transition, including package selection, test development and volume ramp through WIN Semiconductors and downstream partners.

PLAN & ESTIMATE