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Case Study: Writing a Substrate Spec a Supplier Can Quote — Silicon, SOI and Glass

How to write a silicon, SOI and glass wafer specification that a supplier can quote without coming back with questions: prime versus test grade surface limits, the SOI layer stack, borosilicate glass parameters, and which tolerance actually decides performance.

September 26, 2026Updated September 26, 20268 min readBy Henry
Case StudySubstratePackagingYield

This is a real sourcing inquiry, not a template. It covered seven line items: 6-inch prime-grade silicon at two thicknesses, 6-inch test-grade, 4-inch prime, 6-inch SOI, and 6-inch and 4-inch borosilicate glass. Supplier names and prices are withheld; the specification content is reported as written.

The value of looking at a real one is that every line in it exists for a reason, and the lines people omit are the ones that generate a second round of questions from the supplier.

Prime versus test grade: the surface limits

Both grades in this inquiry were CZ-grown, N-type phosphorus-doped, <100> ±0.5°, 1–10 Ω·cm, double-side polished with two SEMI standard flats. The difference is entirely in the surface limits:

  • Prime grade: TTV < 5 µm, BOW < 30 µm, WARP < 40 µm, surface roughness Ra < 1 nm
  • Test grade: TTV < 10 µm, same BOW and WARP limits, same thickness tolerance
  • Both: thickness 675 µm ± 20 µm on the 6-inch 675 µm item; ± 40 µm on the test-grade variant

The SOI stack

The SOI item was specified for pressure sensor fabrication, and the three thicknesses are the whole specification:

  • Device silicon: 30 ± 0.5 µm, N-type <100>, resistivity 1–10 Ω·cm
  • Buried oxide: 1 ± 0.1 µm
  • Handle silicon: 400 ± 8 µm
  • Double-side polished, surface roughness < 1 nm

Why the device layer tolerance is the tight one

Half a micron on thirty. That tolerance is what determines how repeatable the sensor's diaphragm thickness is, and therefore how tightly the device performance can be specified. A supplier who cannot hold ±0.5 µm on the device layer is not a substitute supplier for this part, whatever their price on the handle wafer.

Borosilicate glass

The glass items were specified as borosilicate, 1000 ± 20 µm thick, double-side polished, Ra < 5 nm, with a protective chamfer on the edge and two half-standard flats for alignment. The chamfer and the flats are easy to omit and both generate a follow-up question if left out: the chamfer affects handling in cassettes, and the number and orientation of flats affects how the wafer seats in downstream fixtures.

Why SOI has to be specified as a separate part

SOI is not a silicon wafer with an option box ticked. It is made by bonding a handle wafer to a device wafer with an oxide layer between, then grinding and etching the device side back to thickness. That is a separate manufacturing chain, which is why it behaves differently from the other six line items in the inquiry.

The practical consequence is that it cannot be substituted on price. A supplier quoting silicon competitively is not automatically quoting SOI competitively, and the device-layer tolerance is the parameter where that shows up first.

Commercial structure worth knowing in advance

The quote carried a 30-day validity, 13% VAT invoicing and 100% prepayment. None of those are unusual for small-volume substrate orders, and all three are easier to accept before they are read for the first time on a quote that is already against a deadline. Asking about validity and payment terms at inquiry stage, alongside the technical questions, costs nothing.

Outcome

The seven line items were specified, quoted and delivered against the requirements above. The specification described here is the one the supplier quoted from — there was no second clarification round — and the material delivered met the customer's requirements.

Article FAQ

Quick answers tied to this topic

For process development, equipment qualification, test vehicle runs and anything where the wafer is a carrier rather than the product. Not for a bonded surface, not for an optical surface, and not where the wafer's flatness sets a lithography depth of focus margin. The price difference is real but so is the TTV difference, and TTV is what bites in bonding and double-side processing.

In an SOI pressure sensor the device layer becomes the diaphragm, and diaphragm thickness sets sensitivity directly. A ±0.5 µm tolerance on 30 µm is under 2%, which is what makes the sensor spec achievable. The handle layer only carries the mechanical body, so its tolerance is far looser. Suppliers can usually trade one against the other on price, which is why stating both explicitly is worth the effort.

Yes, including how many. One SEMI flat and two SEMI flats are different products, and the crystallographic reference they provide matters for anisotropic etching and for downstream fixture seating. It is a one-line item in the spec and a whole round of clarification if it is missing.

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